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Updated: Sep 17, 2025

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Electronic transport simulations of Ni/graphene, hBN, MoSe2/Ni vertical junctions
Gaëlle Bigeard1, Zineb Kerrami1,2, Francois Triozon2
1University Grenoble Alpes, University Savoie Mont Blanc, CNRS, Grenoble INP, CROMA, 38000 Grenoble, France.
Abstract:
We simulate the electronic and transport properties of metal/two-dimensional material/metal vertical heterostructures, with a focus on graphene, hexagonal boron nitride and two phases of molybdenum diselenide. Using density functional theory and non-equilibrium Green's function, we assess how stacking configurations and material thickness impact important properties, such as density of states, potential barriers and conductivity. For monolayers, strong orbital hybridization with the metallic electrodes significantly alters the electronic characteristics, with the formation of states within the gap of the semiconducting two-dimensional materials. Trilayers reveal the critical role of interlayer coupling, where the middle layer retains its intrinsic properties, thus influencing the overall conductivity. Our findings highlight the potential for customized multilayer designs to optimize electronic device performance based on two-dimensional materials.
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