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Graphene patterning without plasma etching via SU-8 pattern peel-off.

Maryam Riyahi1, Gholam-Mohammad Parsanasab2, Mohammad Sabaeian3

  • 1Department of Physics, Faculty of Science, Shahid Chamran University of Ahvaz, Ahvaz, 6135743135, Iran. m.riyahi@yahoo.com.

Scientific Reports
|July 4, 2025
PubMed
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Researchers developed a new method for patterning graphene using SU-8 photoresist. This technique enables the creation of micrometer-sized graphene components and is compatible with imprint lithography for mass production.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Lithography

Background:

  • Graphene patterning tools are not universally accessible to researchers.
  • Developing accessible and efficient graphene patterning methods is crucial for scientific advancement.

Purpose of the Study:

  • To investigate a novel method for patterning graphene layers on substrates using SU-8 photoresist.
  • To produce micrometer-sized graphene components, such as electrodes.
  • To explore compatibility with imprint lithography for scalable manufacturing.

Main Methods:

  • Utilizing SU-8 photolithography to create an inverse pattern on the graphene layer.
  • Simultaneously removing the SU-8 pattern and attached graphene to achieve the final graphene pattern.
  • Adapting the method for imprint lithography by transferring non-crosslinked SU-8 via a stamp.
Keywords:
GrapheneGraphene patterningGraphene removalMechanical removalSU-8Wet etching

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Main Results:

  • Successful patterning of graphene layers into micrometer-sized structures.
  • Demonstrated sufficient adhesion between graphene and cross-linked SU-8.
  • Established a framework for extending the method to imprint lithography.

Conclusions:

  • The developed SU-8 based photolithography offers a viable approach for graphene patterning.
  • The method facilitates the fabrication of microscale graphene components.
  • Compatibility with imprint lithography opens possibilities for mass production and reduced contamination.