Machine learning-assisted high-throughput prediction and experimental validation of high-responsivity extreme
R A W Ayyubi1, Mei Xian Low2, Salar Salimi3
1Department of Physics, University of Illinois at Chicago, Chicago, Illinois, USA.
None:
Identifying materials with optimal optoelectronic properties for targeted applications represents both a critical need and a persistent challenge in optoelectronic device engineering. Machine learning models often depend on extensive datasets, which are typically lacking in specialized research domains such as extreme ultraviolet (EUV) radiation detection. Here, we demonstrate a Cross-Spectral Response Prediction framework that leverages existing visible and ultraviolet (UV) photoresponse data to predict more efficient material's performance under EUV radiation. Our predictive model, based on Extremely Randomized Trees, correlates physical descriptors with performance across different spectral regions using a comprehensive dataset of 1927 samples. Through this approach, we identified promising materials such as α-MoO3, MoS2, ReS2, PbI2, and SnO2, achieving responsivities varying from 20 to 60 A/W, exceeding conventional silicon photodiodes by ~225 times in EUV sensing applications. Monte Carlo simulations revealed double electron generation rates (~2×106 electrons per million EUV photons) compared to silicon, with experimental validation confirming the effectiveness of our prediction framework for accelerating the discovery of other high performing materials for diverse spectral applications.
More Related Videos
10:33Expedited Radiation Biodosimetry by Automated Dicentric Chromosome Identification ADCI and Dose Estimation
Published on: September 4, 2017
07:48High Spatial Resolution Chemical Imaging of Implant-Associated Infections with X-ray Excited Luminescence Chemical Imaging Through Tissue
Published on: September 30, 2022
