Multi-head spatial atomic layer deposition: a robust approach for precise doping and nanolaminate fabrication in...

Area of Science:

• Materials Science
• Nanotechnology
• Chemical Engineering

Background:

• Open-air nanolaminate fabrication requires scalable, precise methods.
• Conventional spatial atomic layer deposition (SALD) faces limitations in layer accuracy and interface sharpness.

Purpose of the Study:

• To develop an innovative multi-head SALD system for precise open-air nanolaminate manufacturing.
• To demonstrate the system's capability for controlled deposition of multilayer structures.

Main Methods:

• A novel multi-head SALD system was designed with a uniform head for zinc oxide (ZnO) and a combinatorial head for aluminum oxide (Al2O3) thickness gradients.
• Eight ZnO/Al2O3 bilayers were deposited in open air at 200 °C.
• Characterization included transmission electron microscopy, X-ray photoelectron spectroscopy, and Kelvin probe measurements.

Main Results:

• Highly sharp and reproducible layer structures with minimal thickness deviation (0.3 nm) were achieved.
• Surface roughness decreased from 0.58 to 0.33 nm with increasing Al2O3 thickness.
• Work function shifted from 4.75 to 4.35 eV due to Al2O3 passivation.

Conclusions:

• The multi-head SALD method provides a robust platform for precise multilayer control in open-air conditions.
• This approach facilitates optimized experimental conditions and combinatorial strategies for materials research.
• The developed system enables advancements in scalable, high-precision nanolaminate manufacturing.