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Volumetric Patterning of Gels via Super Resolved Interference Lithography.

Shaheen Hasan1, Gopal S Kenath1, Mrigaraj Goswami1

  • 1Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, United States.

ACS Applied Materials & Interfaces
|July 17, 2025
PubMed
Summary

Researchers achieved super-resolution volumetric patterning of photochromic gels using interference lithography. This technique enables precise 3D microfabrication of thick polymer films with nanoscale features.

Keywords:
gelsinterference lithographyphotochromic switchspirothiopyransuper-resolution

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Area of Science:

  • Materials Science
  • Photochemistry
  • Nanotechnology

Background:

  • Photochromic materials offer tunable optical properties.
  • Volumetric patterning is crucial for advanced 3D microfabrication.
  • Interference lithography enables high-resolution patterning.

Purpose of the Study:

  • To demonstrate volumetric patterning of photochromic gels using super-resolution interference lithography.
  • To optimize patterning parameters for thick gel films.
  • To achieve nanoscale feature resolution.

Main Methods:

  • Utilizing two-color interference lithography with UV LEDs and visible-light laser diodes.
  • Employing ethylene glycol as a solvent to control photochromic switch photophysics.
  • Post-functionalizing polyacrylamide gels with spirothiopyran photoswitches.

Main Results:

  • Achieved volumetric patterning of thick gel films (tens of microns).
  • Demonstrated super-resolved critical dimensions of approximately 90 nm.
  • Obtained resolutions of approximately 220 nm using phase-shifted double exposures.

Conclusions:

  • Super-resolution interference lithography is effective for volumetric patterning of photochromic gels.
  • Solvent choice and gel swelling are critical for successful patterning.
  • The method allows for high-resolution 3D microfabrication with potential for reduced exposure times.