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Volumetric Patterning of Gels via Super Resolved Interference Lithography
Shaheen Hasan1, Gopal S Kenath1, Mrigaraj Goswami1
1Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, United States.
ACS Applied Materials & Interfaces
|July 17, 2025
Summary
Researchers achieved super-resolution volumetric patterning of photochromic gels using interference lithography. This technique enables precise 3D microfabrication of thick polymer films with nanoscale features.
Area of Science:
- Materials Science
- Photochemistry
- Nanotechnology
Background:
- Photochromic materials offer tunable optical properties.
- Volumetric patterning is crucial for advanced 3D microfabrication.
- Interference lithography enables high-resolution patterning.
Purpose of the Study:
- To demonstrate volumetric patterning of photochromic gels using super-resolution interference lithography.
- To optimize patterning parameters for thick gel films.
- To achieve nanoscale feature resolution.
Main Methods:
- Utilizing two-color interference lithography with UV LEDs and visible-light laser diodes.
- Employing ethylene glycol as a solvent to control photochromic switch photophysics.
- Post-functionalizing polyacrylamide gels with spirothiopyran photoswitches.
Main Results:
- Achieved volumetric patterning of thick gel films (tens of microns).
- Demonstrated super-resolved critical dimensions of approximately 90 nm.
- Obtained resolutions of approximately 220 nm using phase-shifted double exposures.
Conclusions:
- Super-resolution interference lithography is effective for volumetric patterning of photochromic gels.
- Solvent choice and gel swelling are critical for successful patterning.
- The method allows for high-resolution 3D microfabrication with potential for reduced exposure times.
