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Reversible CO Insertion into the Si = Si Double Bond Enables a Disila-Bislactone Formation via Subsequent CO2

Fiona J Kiefer1, Arseni Kostenko1, Richard Holzner1

  • 1TUM School of Natural Sciences, Department of Chemistry, Institute of Silicon Chemistry and Catalysis Research Center, Technische Universität München, Lichtenbergstraße 4, Garching bei München 85748, Germany.

Journal of the American Chemical Society
|July 21, 2025
PubMed
Abstract

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