Additive Manufacturing of Nano-Micro Carbon Structures via Two-Photon Lithography

Two-Photon Lithography (TPL), a revolutionary additive manufacturing technique that transcends the diffraction limit, empowers nanoscale-precise fabrication of 3D architectures. This breakthrough capability facilitates the creation of intricate micro-nano devices with exceptional structural flexibility and compatibility with multi-material systems, thereby catalyzing transformative developments in carbon-based micro-nanotechnology. This perspective systematically examines recent progress in TPL-enabled carbon material innovations, particularly highlighting the enhanced mechanical performance in micro-nano carbon structures through optimized laser parameterization and functional device implementations across biomedical interfaces, photonic circuits, and high-density energy storage systems. Critical technical barriers are further identified in manufacturing scalability and material-process interdependencies, proposing synergistic solutions through Artificial intelligence-driven photoresist development, topology optimization algorithms, and automated process control frameworks. The integration of machine learning with TPL workflows is positioned to revolutionize design-to-production paradigms, ultimately enabling industrial-scale manufacturing of next-generation carbon micro-nano devices.