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3D Multiphoton Nanolithography with Bioresorbable Amino Acid-Based Resins.

Christoph Naderer1, Dmitry Sivun1, Stephan Haudum2

  • 1School of Medical Engineering and Applied Social Science, University of Applied Sciences Upper Austria, 4020 Linz, Austria.

Nano Letters
|July 24, 2025
PubMed
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New amino acid phosphorodiamidate resins (APdA) enable sub-100 nm feature fabrication via 3D multiphoton lithography. These hydrophobic nanostructures show tunable mechanical properties and can be functionalized for biomedical applications.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Polymer Chemistry

Background:

  • Advanced lithography techniques are crucial for fabricating nanoscale structures.
  • Developing novel photoresists with tunable properties is essential for nanotechnology and biomedical applications.

Purpose of the Study:

  • To introduce and characterize novel amino acid phosphorodiamidate (APdA) resins for 3D multiphoton lithography.
  • To evaluate the physical and chemical properties of APdA-based nanostructures.
  • To demonstrate the utility of APdA nanostructures in biomedical applications.

Main Methods:

  • Fabrication of sub-100 nm features using 3D multiphoton lithography with APdA resins.
  • Quantitative analysis of feature size, Young's modulus, and functionalization using atomic force microscopy and single-molecule fluorescence microscopy.
Keywords:
Amino Acid-Based ResinBioresorbable ResinExtracellular VesiclesMechanical PropertiesMultiphoton Lithography

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  • Assessment of polymer swelling and mechanical property changes in aqueous environments.
  • Biotinylation of APdA structures for extracellular vesicle immobilization.

    • Main Results:

    • Successfully fabricated sub-100 nm features using APdA resins.
    • APdA polymers exhibit hydrophobic properties, limiting swelling to 8% in aqueous conditions.
    • Young's modulus showed a significant change (up to 10-fold) between dry and wet states.
    • Demonstrated successful immobilization of extracellular vesicles via biotin functionalization.

    Conclusions:

    • APdA resins are effective photoresists for high-resolution 3D nanolithography.
    • The developed nanostructures possess tunable mechanical properties and low swelling, suitable for aqueous environments.
    • APdA-based nanolithography offers a versatile platform for advanced biomedical and nanotechnology applications.