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Updated: Sep 13, 2025

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Self-Calibrating TSEP for Junction Temperature and RUL Prediction in GaN HEMTs
Yifan Cui1,2, Yutian Gan1, Kangyao Wen1
1Engineering Research Center of Integrated Circuits for Next-Generation Communications, Ministry of Education, School of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, China.
Abstract:
Gallium nitride high-electron-mobility transistors (GaN HEMTs) are critical for high-power applications like AI power supplies and robotics but face reliability challenges due to increased dynamic ON-resistance (RDS_ON) from electrical and thermomechanical stresses. This paper presents a novel self-calibrating temperature-sensitive electrical parameter (TSEP) model that uses gate leakage current (IG) to estimate junction temperature with high accuracy, uniquely addressing aging effects overlooked in prior studies. By integrating IG, aging-induced degradation, and failure-in-time (FIT) models, the approach achieves a junction temperature estimation error of less than 1%. Long-term hard-switching tests confirm its effectiveness, with calibrated RDS_ON measurements enabling precise remaining useful life (RUL) predictions. This methodology significantly improves GaN HEMT reliability assessment, enhancing their performance in resilient power electronics systems.
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