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Kinetics of Excited OH Formation in H + N2O and NH + NO Reactions at High Temperatures
1National Institute of Advanced Industrial Science and Technology (AIST), 16-1 Onogawa, Tsukuba 305-8569, Japan.
Abstract:
The reactions H + N2O → N2 + OH* (R1) and NH + NO → N2 + OH* (R2) have been proposed as sources of the electronically excited OH(A2Σ+) radicals, denoted as OH*, during combustion of nitrogen-containing compounds. The present study investigates the kinetics of these reactions through OH* emission experiments using a shock tube. Time profiles of OH* concentration measured for several shock-heated mixtures are analyzed with the help of kinetic simulations. The rate constants for R1 are determined using the profiles obtained from H2/N2O/Ar, NH3/N2O/Ar, and C2H5I/N2O/Ar mixtures and can be expressed as k1 = (8.4 ± 3.8) × 10-11 exp(-22900 K/T) cm3 molecule-1 s-1 over the temperature range of T = 1600-2200 K. For R2, the rate constants are obtained from the measurements for NH3/NO/Ar and NH3/N2O/NO/Ar mixtures and are represented as k2 = (1.6 ± 0.8) × 10-13 exp(-10040 K/T) cm3 molecule-1 s-1 over 2000-2600 K. Possible mechanisms for the formation of OH* are discussed based on a comparison of the rate constants.
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