Electrical Performance of ZTO Thin-Film Transistors and Inverters

In this study, zinc-tin oxide (ZTO) thin films were prepared via radio-frequency magnetron sputtering to examine the influence of annealing temperature on the performance of thin-film transistors (TFTs) and their resistive-load inverters. The findings reveal that annealing modulates the concentration and spatial distribution of oxygen vacancies (V_O), which directly affect carrier density and interface trap density, ultimately determining the electrical behavior of inverters. At the optimal annealing temperature of 600 °C, the V_O concentration was effectively moderated, resulting in a TFT with a mobility of 12.39 cm² V^-1 s^-1, a threshold voltage of 6.13 V, an on/off current ratio of 1.09 × 10⁸, and a voltage gain of 11.77 in the corresponding inverter. However, when the V_O concentration deviated from this optimal range, whether in excess or deficiency, the gain was reduced and power consumption increased. This V_O engineering strategy enables the simultaneous optimization of both TFT and inverter performance without relying on rare elements, offering a promising pathway toward the development of low-cost, large-area, flexible, and transparent electronic devices.