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Updated: Jun 13, 2026

Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
Tailored sliding ferroelectricity for ultrahigh fatigue resistance in stacked trilayer MoS2 crystals
Aiqing Fan1,2,3, Qing Zhang1,2,3, Zihao Yang4
1State Key Laboratory of Advanced Materials for Intelligent Sensing, Ministry of Science and Technology & Key Laboratory of Organic Integrated Circuit, Ministry of Education & Tianjin Key Laboratory of Molecular Optoelectronic Sciences, Department of Chemistry, School of Science, Tianjin University, Tianjin 300072, China.
Abstract:
Fatigue-resistant ferroelectric materials in two-dimensional systems are crucial for next-generation electronic devices, but the relationship between stacking configurations and ferroelectric behavior remains underexplored. Here, we synthesize trilayer MoS2 crystals with three noncentrosymmetric stacking configurations (AAA, AAB, and ABB) using a thermal gradient chemical vapor deposition strategy. Notable variations in room-temperature ferroelectricity are observed, with polarization strength following the order AAA > AAB > ABB, up to 0.110 microcoulombs per square centimeter. The total stress time for AAA, AAB, and ABB configurations is 106 seconds under a 10-microsecond pulse width. We also identify an oscillatory feature between stacking configurations and ferroelectric polarization in multilayer systems. This work establishes a distinctive paradigm for designing robust, high-performance ferroelectric materials, unlocking scalable solutions for next-generation memory and electronic applications.
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