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Updated: Sep 12, 2025

Plasma-Assisted Molecular Beam Epitaxy Growth of Mg3N2 and Zn3N2 Thin Films
Published on: May 11, 2019
Ternary MgZ2 N4 (Z = Ge, Si) and Janus MgGeSiN4 monolayers: high stability with distinctive electronic and magnetic
Warda Elaggoune1, Yusuf Zuntu Abdullahi2,3, Sohail Ahmad4
1Laboratoire de Physique des Matériaux (L2PM), Faculté des Mathématiques, de l'informatique et des Sciences de la Matière, Université 8 Mai 1945 BP 401 Guelma Algeria elaggoune.warda@univ-guelma.dz.
Abstract:
The recent synthesis of two-dimensional (2D) MoSi2N4 and WSi2N4 crystals has given rise to a new class of 2D materials with distinctive properties and significant potential for advanced technologies. The transition metal (TM) elements can potentially be substituted with other elements from the periodic table, enabling the introduction of new members into this emerging 2D family. Building on this framework, we propose a new family of light-element-based 2D ternary compounds of MgZ2N4 (Z = Si, Ge) and their Janus derivative MgGeSiN4 using first-principles density functional theory (DFT) calculations. All three monolayers are found to be dynamically, thermally, and mechanically stable. MgGe2N4 exhibits a metallic antiferromagnetic (AFM) ground state within the PBE functional, while more accurate HSE-level calculations reveal a weak ferrimagnetic (FiM) configuration. Conversely, MgSi2N4 is a robust half-metallic ferromagnet with 100% spin polarization and a sizable magnetic moment of 5.62μ B per unit cell. Janus MgGeSiN4 shows FiM metallic behavior, driven by structural asymmetry. All systems favor an in-plane easy axis magnetization, and our analysis shows that their magnetic behavior follows a unique low-temperature Berezinskii-Kosterlitz-Thouless (BKT) transition, characteristic of the 2D XY-like model. The estimated BKT transition temperatures for MgGe2N4, MgSi2N4, and MgGeSiN4 are approximately 19 K, 4 K, and 16 K, respectively. This study presents the first report of intrinsic FM, AFM, and FiM in this monolayer family, highlighting their potential for advanced low-temperature magnetic device applications.
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