Up to 48× Density Multiplication Achieved by Directed Self-Assembly on Plasma-Trimmed Honeycomb Templates

Area of Science:

• Materials Science
• Nanotechnology
• Semiconductor Manufacturing

Background:

• Direct self-assembly (DSA) is crucial for pattern density multiplication in photolithography.
• Current DSA methods face limitations in achieving defect-free, high-multiplication factor ordered arrangements.
• Scaling nanomanufacturing requires overcoming challenges in defect control and achieving higher densities.

Purpose of the Study:

• To develop an innovative guiding method for cylindrical polystyrene-block-polymethylmethacrylate (PS-b-PMMA) for direct self-assembly.
• To achieve a high multiplication factor for ordered nanopore arrays.
• To demonstrate a feasible pathway for high-density multiplication in nanomanufacturing.

Main Methods:

• Fabrication of honeycomb guiding templates for DSA using a two-step lithography and trimming process.
• Utilizing an ingenious trimming technique to double the guiding pattern density.
• Employing coarse-grained simulations to validate DSA effects and analyze guiding scheme performance.

Main Results:

• Achieved a maximum multiplication factor of 48× for cylindrical block copolymers.
• Demonstrated long-range ordered block copolymer microdomains with a boomerang-shaped, triaxially symmetric template.
• Obtained ordered nanopore arrays with excellent placement accuracy, pattern uniformity, and transferability.

Conclusions:

• The proposed guiding scheme offers a robust anchoring mechanism for achieving high multiplication factors in DSA.
• This method presents a promising solution for scalable nanomanufacturing of high-density nanopore arrays.
• The study validates the potential of advanced template design for overcoming limitations in current photolithographic manufacturing.