Atomic-Precision Heterojunction Textiles Enable Sunlight-Powered Self-Disinfection

Cotton fabrics are prone to harboring pathogenic microorganisms due to their microporous structure, leading to material degradation and potential health hazards. While conventional sterilization methods in medical systems such as autoclaving, UV irradiation, and chemical disinfectants are constrained by equipment reliance, restricted applicability, and possible hazards, this study introduces a sunlight-driven antibacterial solution. By constructing a pg-C₃N₄/ZnO heterojunction photosensitizer on the fabric surface, a Schottky barrier was created at the interfaces of ZnO and pg-C₃N₄, which enhanced carrier separation efficiency under solar illumination, thereby boosting reactive oxygen species generation for efficient sterilization. To overcome the limitations of traditional loading techniques such as impregnation and chemical precipitation in achieving precise ZnO deposition on pg-C₃N₄, atomic layer deposition was employed to optimize the heterojunction's interfacial structure and energy band alignment, thereby maximizing ROS generation (demonstrating a 3.63-fold enhancement) and enabling efficient sunlight-driven antibacterial activity. The resulting composite exhibits dual antimicrobial mechanisms: high ROS concentrations induce oxidative damage to bacterial membranes, DNA, and proteins, while Zn²⁺ release from ZnO decomposition further disrupts microbial metabolism. Through stable amine-aldehyde covalent grafting, the pg-C₃N₄/ZnO system demonstrates durable antibacterial performance, rapid sterilization under washing, drying, and daily use conditions, and excellent scalability. This cost-effective and eco-friendly technology holds significant promise for applications in hygienic textiles, medical environments, and public infrastructure.