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Full-field source and mask optimization using gradient surgery strategy.

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    Gradient surgery (GS) theory resolves gradient conflicts in full-field source and mask optimization (FFSMO) for lithography. This method enhances imaging fidelity and uniformity across the full exposure field.

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    Area of Science:

    • * Semiconductor manufacturing
    • * Optical lithography
    • * Computational lithography

    Background:

    • * Lithography objectives exhibit uneven aberrations across different field points, impacting imaging quality.
    • * Full-field source and mask optimization (FFSMO) aims to mitigate these aberrations but faces convergence issues due to gradient conflicts between field points.

    Purpose of the Study:

    • * To address the gradient conflict problem in FFSMO for improved lithographic imaging.
    • * To enhance the convergence and optimality of FFSMO using gradient surgery theory.

    Main Methods:

    • * Application of gradient surgery (GS) theory to resolve gradient conflicts in FFSMO.
    • * Projection of each field point's gradient onto the gradient normal plane of conflicting field points.
    • * Updating source and mask patterns based on corrected gradient information.

    Main Results:

    • * The proposed Gradient Surgery-Full Field Source and Mask Optimization (GS-FFSMO) method effectively mitigates gradient conflicts.
    • * Significant improvement in lithography imaging fidelity and uniformity across the full exposure field was observed.
    • * GS-FFSMO demonstrates superior performance compared to traditional FFSMO.

    Conclusions:

    • * Gradient surgery is a viable approach to overcome gradient conflicts in FFSMO.
    • * The GS-FFSMO method enhances the precision and consistency of lithographic imaging.
    • * This technique offers a pathway to optimize complex lithography processes for advanced semiconductor manufacturing.