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Updated: Sep 11, 2025

The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry
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Robust integrated optical feedback interferometry via variable optical attenuation.

Ayesha Arshad, Usman Zabit, Olivier Bernal

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    Summary
    This summary is machine-generated.

    This study introduces an on-chip optical feedback interferometry system with a variable optical attenuator for precise displacement measurements. The integrated system ensures robust operation by controlling optical feedback, enabling applications like micro-electro-mechanical systems characterization.

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    Area of Science:

    • Photonics and Instrumentation
    • Optical Metrology
    • Micro-Electro-Mechanical Systems (MEMS)

    Background:

    • Optical feedback interferometry (OFI) instruments require precise control of back-reflected light for robust operation.
    • Uncontrolled optical feedback can degrade the performance and reliability of OFI systems.

    Purpose of the Study:

    • To propose and analyze an on-chip optical feedback interferometry system with an integrated variable optical attenuator.
    • To demonstrate high-precision displacement measurements in OFI systems with significant optical reflections.

    Main Methods:

    • Development of a novel analytical model for the on-chip OFI system.
    • Integration of a realistic variable optical attenuator design.
    • Simulation and analysis of displacement measurement precision across a range of feedback parameters (2 < C < 100).

    Main Results:

    • The proposed system achieves high-precision displacement measurements for target distances up to a few centimeters.
    • The integrated variable optical attenuator effectively controls optical feedback.
    • The system demonstrates robust performance across a wide feedback parameter range.

    Conclusions:

    • The on-chip OFI system with an integrated variable optical attenuator offers a robust solution for precise short-distance measurements.
    • This technology is suitable for applications with significant and varying optical reflections, such as MEMS characterization.
    • The developed analytical model provides a foundation for further optimization of OFI systems.