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Updated: Sep 11, 2025

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
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Robustness optimization of superlens imaging structures in surface plasmon lithography.

Pengyu Ren, Huwen Ding, Libin Zhang

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    |August 13, 2025
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    Summary

    Surface plasmon lithography (SPL) offers advanced integrated circuit manufacturing potential. This study introduces robust imaging structures for improved compatibility with diverse patterns, enhancing SPL performance.

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    Area of Science:

    • Nanofabrication
    • Optics
    • Materials Science

    Background:

    • Surface plasmon lithography (SPL) utilizes evanescent waves to surpass diffraction limits for integrated circuit (IC) manufacturing.
    • Existing research in SPL primarily addresses resolution enhancement, overlooking compatibility with complex and diverse IC mask patterns.

    Purpose of the Study:

    • To introduce and investigate the concept of robust imaging structures in SPL.
    • To develop a framework for robustness optimization of SPL imaging structures.
    • To evaluate imaging quality and pattern compatibility using the coherent transfer function (CTF).

    Main Methods:

    • Introduction of the robust imaging structure concept for SPL.
    • Establishment of a flow for robustness optimization.
    • Analysis of imaging quality and compatibility using the coherent transfer function (CTF).
    • Examination of the influence of PMMA and photoresist (Pr) thicknesses, and top Ag layer thickness on imaging quality.

    Main Results:

    • Robust imaging structures demonstrate higher amplitude and broader high-amplitude bandwidth in evanescent wave spatial frequencies.
    • Improved compatibility of imaging structures with diverse mask patterns is achieved.
    • Simulation experiments and analytical demonstrations validate the findings.

    Conclusions:

    • Robust imaging structures enhance the compatibility of SPL with varied mask patterns, crucial for advanced IC manufacturing.
    • The proposed optimization method guides the development of SPL imaging structures for practical applications.
    • This approach is suitable for robustness optimization across diverse mask patterns at advanced technology nodes.