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Related Experiment Video

Updated: Sep 11, 2025

Polymeric Microneedle Array Fabrication by Photolithography
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Polymeric Microneedle Array Fabrication by Photolithography

Published on: November 17, 2015

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Fabrication of microlens array using backside exposure and DMD-based grayscale lithography.

Chien-Kai Hung, Chun-Ying Wu, Yung-Chun Lee

    Optics Express
    |August 13, 2025
    PubMed
    Summary

    This study presents a novel digital micromirror device (DMD) system for fabricating aspherical microlens arrays. The oblique stepping method ensures precise UV dose control for accurate microlens shaping.

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    Area of Science:

    • Optics and Photonics
    • Microfabrication Technologies
    • Materials Science

    Background:

    • Microlens arrays are crucial optical components in various applications.
    • Traditional fabrication methods face challenges in achieving precise aspherical profiles and scalability.
    • Digital micromirror devices (DMDs) offer potential for maskless, high-resolution patterning.

    Purpose of the Study:

    • To develop and demonstrate a novel DMD-based grayscale ultraviolet (UV) lithography system for fabricating aspherical microlens arrays.
    • To investigate the efficacy of an oblique stepping method for precise UV dose control.
    • To enable direct fabrication using negative-tone photoresist (PR) materials on transparent substrates.

    Main Methods:

    • Implementation of a grayscale UV exposure system utilizing a digital micromirror device (DMD).
    • Employment of an oblique stepping method, tilting the DMD array during step-by-step exposure.
    • Utilizing backside UV patterning on a transparent substrate for direct negative-tone PR processing.
    • Theoretical analysis, numerical modeling, and experimental validation.

    Main Results:

    • Accurate shaping of aspherical microlens array profiles achieved through controlled UV dose distribution.
    • High spatial resolution patterning enabled by the DMD and oblique stepping approach.
    • Successful fabrication of microlens arrays using negative-tone photoresist materials.
    • Demonstrated feasibility of the proposed backside UV patterning technique.

    Conclusions:

    • The DMD-based grayscale UV lithography system with oblique stepping is a viable method for fabricating high-quality aspherical microlens arrays.
    • The backside patterning approach simplifies the fabrication process by allowing direct use of negative-tone PR.
    • This technique offers a scalable and precise solution for advanced optical component manufacturing.