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Related Experiment Video

Updated: Sep 11, 2025

Optimized Workflow for Iterative Bleaching Extends Multiplexity Imaging of Highly Autofluorescent Clinical Samples
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High- and Low-Fluorescent Photoinitiators for Multiphoton Lithography.

Dimitra Ladika1,2, Michalis Stavrou1, Gordon Zyla1,2

  • 1Institute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas, 70013 Heraklion, Greece.

ACS Applied Polymer Materials
|August 14, 2025
PubMed
Summary

New low-fluorescence photoinitiators significantly improve multiphoton lithography by reducing autofluorescence and enhancing nonlinear optical properties for advanced 3D microfabrication.

Keywords:
Multiphoton lithographyfluorescencenonlinear optical propertiesphotoinitiatorspolymerization

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Area of Science:

  • Additive Manufacturing
  • Materials Science
  • Photonics

Background:

  • Multiphoton lithography (MPL) fabricates 3D micro/nanostructures, vital for photonics and biomedicine.
  • Photoinitiator (PI) choice is critical for MPL performance, but conventional PIs exhibit high autofluorescence, limiting applications.

Purpose of the Study:

  • To systematically study nonlinear optical (NLO) properties of lab-made low-fluorescence PIs (LF-PIs) and compare them to high-fluorescence PIs (HF-PIs).
  • To evaluate the effectiveness of these PIs for MPL applications, especially in fluorescence-sensitive contexts.

Main Methods:

  • Investigated NLO properties using two-beam initiation threshold (2-BIT) and Z-scan techniques in solution and SZ2080 photoresist.
  • Characterized NLO properties and performed MPL tests within a single optical setup under identical laser conditions (150 fs, 780 nm).
  • Assessed fluorescence using photoluminescence analysis.

Main Results:

  • LF-PIs showed up to 2 orders of magnitude lower fluorescence than HF-PIs.
  • LF-PIs exhibited up to 10-fold higher NLO absorption-related parameters, suggesting fluorescence can interfere with polymerization.
  • MPL with LF-PIs in SZ2080 achieved performance comparable to benchmark SBB, with improved selective fluorescence in printed structures.

Conclusions:

  • Lab-made LF-PIs offer superior NLO properties and reduced fluorescence compared to HF-PIs for MPL.
  • The developed PIs are highly suitable for MPL, particularly for fluorescence-sensitive applications like bio-related scaffolds.
  • This study provides an efficient method for evaluating PIs for MPL suitability.