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Updated: Sep 10, 2025

A Photonic System for Generating Unconditional Polarization-Entangled Photons Based on Multiple Quantum Interference

A Photonic System for Generating Unconditional Polarization-Entangled Photons Based on Multiple Quantum Interference

Published on: September 5, 2019

A compact tabletop extreme-ultraviolet source for polarization-sensitive ptychographic imaging.

Taylor J Buckway¹, Aaron Redd¹, Hyrum Taylor¹

¹Department of Physics and Astronomy, Brigham Young University, Provo, Utah 84604, USA.

The Review of Scientific Instruments

|August 20, 2025

Summary

A new compact extreme-ultraviolet (XUV) light source enables polarization-sensitive imaging for advanced materials. This high harmonic generation (HHG) system achieves 160 nm resolution, crucial for computer chip manufacturing.

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Direct Imaging of Laser-driven Ultrafast Molecular Rotation

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Area of Science:

Optics and Photonics
Materials Science
Semiconductor Manufacturing

Background:

Advancements in computer chip manufacturing require enhanced extreme-ultraviolet (XUV) light sources.
Observing novel material properties, such as magnetism, necessitates tunable polarization in XUV sources.
Current XUV sources lack the accessibility and polarization control needed for advanced material characterization.

Purpose of the Study:

To present a compact, tabletop XUV source for polarization-sensitive imaging.
To enable the study of dichroic properties in novel technology materials.
To demonstrate the capability of generating tunable polarized XUV light for high-resolution imaging.

Main Methods:

Development of a compact XUV tabletop source utilizing high harmonic generation (HHG).
Implementation of the MAch-ZEhnder-Less for Threefold Optical Virginia spiderwort apparatus for generating circularly polarized harmonics.
Optimization of linearly polarized 42 eV and 52 eV beams and application of ptychography for imaging.

Main Results:

Achieved optimized average powers of 19.4 nW for the 42 eV beam and 8.0 nW for the 52 eV beam.
Demonstrated the generation of circularly polarized harmonics.
Successfully imaged a Siemens star test target with 160 nm resolution using the 42 eV linearly polarized beam.

Conclusions:

The developed compact XUV source is suitable for polarization-sensitive imaging applications.
The HHG-based source provides tunable polarization, crucial for material property analysis.
The demonstrated resolution of 160 nm highlights the potential for advanced semiconductor metrology.