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Thermal Control Systems in Projection Lithography Tools: A Comprehensive Review.
Di Cao1, He Dong2, Zhibo Zeng1
1State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China.
Micromachines
|August 28, 2025
Summary
This review explores thermal control systems for advanced deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography. It analyzes thermal challenges and solutions to maintain exposure precision in these critical semiconductor manufacturing tools.
Area of Science:
- Semiconductor Manufacturing
- Optical Engineering
- Thermal Management
Background:
- State-of-the-art deep ultraviolet (DUV) and extreme ultraviolet (EUV) projection lithography tools are essential for semiconductor fabrication.
- These systems comprise critical subsystems like light sources, stages, optics, and metrology.
- Thermal perturbations significantly degrade thermal stability and uniformity, compromising exposure precision.
Purpose of the Study:
- To review thermal control system designs for DUV and EUV lithography tools.
- To systematically analyze thermal challenges within each lithographic subsystem.
- To synthesize existing thermal control strategies and discuss future advancements.
Main Methods:
- Systematic review of thermal control systems in DUV and EUV lithography.
- Analysis of thermal challenges across subsystems including light source, stages, optics, and metrology.
- Categorization of thermal control solutions into structures and algorithms.
Main Results:
- Identified critical subsystems susceptible to thermal degradation under high-power irradiation.
- Synthesized established thermal control structures and algorithms addressing these challenges.
- Highlighted the impact of thermal stability and gradient uniformity on exposure precision.
Conclusions:
- Effective thermal control is crucial for maintaining high precision in advanced lithography.
- A systematic approach to thermal management across all subsystems is necessary.
- Future advancements in thermal control systems will be vital for next-generation lithography tools.
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