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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

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Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used....
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Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

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AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...
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Atomic Emission Spectroscopy: Instrumentation01:22

Atomic Emission Spectroscopy: Instrumentation

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The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.
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Atomic Emission Spectroscopy: Overview01:20

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Atomic emission spectroscopy (AES) is an analytical technique used to determine the elemental composition of a sample by analyzing the light emitted from excited atoms. In AES, atoms in a sample are excited to higher energy levels by thermal energy from high-temperature sources, such as plasma, arcs, or sparks. When these excited atoms return to lower energy states, they emit light at specific wavelengths characteristic of each element. The resulting atomic emission spectrum, which consists of...
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Updated: Sep 8, 2025

Author Spotlight: A Machine-Vision Approach to Transmission Electron Microscopy Workflows, Results Analysis and Data Management
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Resolving In Situ Exposure Dynamics in a Chemically Amplified EUV Photoresist Using Table-Top EUV Photoemission

Dhirendra P Singh1, Laura Galleni1,2, Faegheh S Sajjadian1,2

  • 1Imec, Kapeldreef 75, 3001 Leuven, Belgium.

ACS Applied Materials & Interfaces
|September 5, 2025
PubMed
Summary

Extreme ultraviolet (EUV) lithography

Keywords:
chemically amplified photoresistelectron-induced chemistryextreme ultraviolet (EUV)lithographyphotoemission spectroscopysecondary electrons

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Area of Science:

  • Materials Science
  • Photochemistry
  • Spectroscopy

Background:

  • Extreme ultraviolet (EUV) lithography is crucial for nanoscale manufacturing.
  • Understanding ionization-driven chemistry in photoresists is challenging.
  • Radiochemical transformations during EUV exposure require investigation.

Purpose of the Study:

  • To investigate in situ chemical changes in photoresists during EUV exposure.
  • To identify novel chemical reaction pathways induced by EUV light.
  • To explore the utility of EUV photoemission spectroscopy for studying resist dynamics.

Main Methods:

  • Deployment of table-top EUV photoemission spectroscopy.
  • In situ observation of chemical changes in a model photoresist.
  • Advanced atomistic simulation for theoretical analysis.

Main Results:

  • Discovery of EUV-induced breakdown of perfluoroalkyl substance (PFAS) photoacid generators (PAGs).
  • Observation of valence band peak intensity changes linked to PFAS PAG degradation.
  • Simultaneous resolution of chemical dynamics and electron production via EUV photoemission.

Conclusions:

  • EUV photoemission spectroscopy offers unique insights into photoresist radiochemistry.
  • The developed approach can track PFAS degradation pathways in thin films.
  • Accessible EUV spectroscopy systems can monitor EUV photoresist chemical dynamics.