Simultaneous Interfacial Defect Passivation and Free-Volume Reduction by Fluorinated Hole Transport Materials for

Yifan Xing1, Zhijun Li1, Yongzhe Li2

  • 1Ministry of Education Key Laboratory of Interface Science and Engineering in Advanced Materials, Taiyuan University of Technology, Taiyuan, Shanxi, 030024, P. R. China.