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Swelling-Driven Ultrafast Soft Lithography.

Yukyeong Choi1, Hee Jung Park2, Byoung Hoon Lee1

  • 1Department of Chemical Engineering and Materials Science, Graduate Program in System Health Science and Engineering, Ewha Womans University, Seoul, 03760, Republic of Korea.

Small Methods
|September 13, 2025
PubMed
Summary
This summary is machine-generated.

Introducing stretchable polydimethylsiloxane (PDMS) molds for ultrafast, high-resolution soft lithography. These novel molds enable rapid, cost-effective patterning on various surfaces, significantly advancing microfabrication techniques.

Keywords:
PDMS moldconformal patterningshape‐deformable patterningsoft lithographysolvent swelling

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Area of Science:

  • Microfabrication and Nanotechnology
  • Materials Science
  • Polymer Chemistry

Background:

  • Soft lithography is a scalable technique but faces limitations in processing time, temperature, and cost.
  • Existing rigid molds limit conformal patterning on curved or uneven surfaces.
  • Need for faster, more versatile, and cost-effective soft lithography methods.

Purpose of the Study:

  • To introduce stretchable polydimethylsiloxane (PDMS) molds replicated from compact discs (C-PDMS molds) for advanced soft lithography.
  • To demonstrate ultrafast, high-resolution patterning capabilities on diverse surfaces.
  • To overcome limitations of traditional rigid molds in terms of speed, conformability, and cost.

Main Methods:

  • Replication of compact discs using PDMS to create stretchable molds (C-PDMS molds).
  • Utilizing solvent-induced swelling for rapid patterning (≈10 seconds).
  • Optimization of solvent solubility parameters to maintain pattern fidelity despite mold swelling.
  • Demonstrating conformability to uneven surfaces and shape-deformable patterning.

Main Results:

  • Achieved ultrafast patterning (≈10 s) using C-PDMS molds, significantly faster than existing methods.
  • Maintained high pattern fidelity (submicron resolution, ≈500 nm electrode gaps) even with mold swelling.
  • Enabled conformal patterning on flat and curved surfaces, surpassing rigid mold limitations.
  • Facilitated fabrication of complex structures like overlapped metal grids and island arrays without multiple master molds.
  • Demonstrated fabrication of optically transparent metal patterns.

Conclusions:

  • C-PDMS molds offer a versatile and cost-effective platform for advanced microfabrication.
  • The developed ultrafast and conformal soft lithography method significantly reduces fabrication complexity and cost.
  • This technique opens new possibilities for fabricating microscale devices on various substrates, including flexible and curved ones.