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Related Experiment Video

Updated: Jan 17, 2026

Fabrication and Characterization of Superconducting Resonators
10:26

Fabrication and Characterization of Superconducting Resonators

Published on: May 21, 2016

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Double-patterned waveguide resonators with conventional UV contact lithography.

Pei-Hsun Wang, Hung-Yu Chen, Yi Chang

    Applied Optics
    |September 22, 2025
    PubMed
    Summary
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    We developed a double-patterning technique for fabricating silicon photonics microresonators. This method achieves sub-micrometer gaps, improving quality factors and offering cost-effective, high-resolution integrated photonics.

    Area of Science:

    • Photonics and Optical Engineering
    • Materials Science and Nanotechnology

    Background:

    • Integrated microresonators are crucial components in silicon photonics.
    • Conventional lithography methods face limitations in achieving sub-micrometer feature sizes required for advanced devices.

    Purpose of the Study:

    • To present a novel double-patterning method for fabricating integrated microresonators.
    • To overcome the resolution limitations of conventional ultraviolet contact lithography for silicon photonics.

    Main Methods:

    • Utilized conventional ultraviolet contact lithography with a double-patterning scheme.
    • Individually patterned bus- and resonator-waveguides in a single photoresist spinning and etching process.
    • Achieved sub-micrometer gaps between waveguides, surpassing standard lithography resolution.

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    Main Results:

    • Fabricated integrated microresonators with quality (Q) factors up to approximately 10^4.
    • Attained a maximum measured extinction ratio exceeding 20 dB for the resonators.
    • Demonstrated the capability to achieve sub-micrometer pitches, essential for dense photonic integration.

    Conclusions:

    • The proposed double-patterning method enables easy and low-cost fabrication of high-performance microresonators.
    • This technique pushes the boundaries of conventional lithography for advanced silicon photonics applications.
    • Offers a viable solution for creating integrated photonic devices with improved resolution and performance.