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Development of multilayer monochromators for stripe-free X-ray imaging
Optics Express
|September 23, 2025
Summary
Ultra-high-quality multilayer monochromators eliminate stripe artefacts in X-ray imaging. Ion beam figuring achieved unprecedented surface precision, enabling stripe-free images and improving X-ray beam quality for advanced applications.
Area of Science:
- Optics
- Materials Science
- X-ray Physics
Background:
- Multilayer (ML) monochromators are critical for synchrotron radiation applications like X-ray imaging and diffraction.
- Stripe artefacts caused by surface figure errors on ML monochromators degrade X-ray image quality.
- Minimizing these figure errors is a significant manufacturing challenge.
Purpose of the Study:
- To demonstrate stripe-free X-ray imaging using ultra-high-quality ML monochromators.
- To investigate the relationship between surface errors and stripe artefacts.
- To advance the production of high-performance ML monochromators.
Main Methods:
- Utilized state-of-the-art ion beam figuring (IBF) to create ML substrates with slope errors below 30 nrad rms.
- Employed an advanced deposition system for uniform multilayer coatings.
- Conducted performance tests at the Diamond Light Source B16 beamline using speckle-based metrology.
Main Results:
- Achieved stripe-free X-ray images from fabricated ML monochromators in single and double-bounce configurations.
- Demonstrated excellent image clarity and flat field uniformity.
- Verified the link between wavefront curvature and stripe artefact formation.
Conclusions:
- Developed a method for producing ultra-high-quality ML monochromators free from stripe artefacts.
- IBF technique significantly reduces surface errors, leading to superior imaging performance.
- This breakthrough enhances the utility of ML monochromators in synchrotron radiation facilities.
