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Thickness Influences on Structural and Optical Properties of Thermally Annealed (GaIn)2O3 Films
Shiyang Zhang1, Fabi Zhang1,2, Tangyou Sun1,2
1Key Laboratory of Microelectronic Devices and Integrated Circuits, Guilin University of Electronic Technology, Guilin 541004, China.
None:
This work explores the relationship between the thickness and the structural, morphological, and optical features of thermally annealed (GaIn)2O3 thin films grown by pulsed laser deposition at room temperature. The thickness of the (GaIn)2O3 films varied from 20 to 391 nm with an increase in deposition time. The film with a thickness of about 105 nm showed largest grain size as well as the strongest XRD peak intensity, as measured by atomic force microscopy and X-ray diffraction. The studies on the optical properties show that the bandgap value decreased from 5.14 to 4.55 eV with the change in the film thickness from 20 to 391 nm. The film thickness had a significant impact on the structure, morphology, and optical properties of (GaIn)2O3, and the PLD growth mode notably influenced the film quality. The results suggest that optimizing the film thickness is essential for improving the film quality and achieving the target bandgap.
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