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Published on: June 24, 2018
Electrophoretic Coatings for Orthodontic Implants: Evaluation of Surface Properties, Adhesion, and Antibacterial
Maria Biegun-Żurowska1, Karolina Klesiewicz2, Katarzyna Matysiak1
1Department of Ceramics and Refractories, Faculty of Materials Science and Ceramics, AGH University of Krakow, 30 Mickiewicza Av., 30-059 Krakow, Poland.
Abstract:
In this study, the properties of electrophoretically deposited (EPD) coatings on orthodontic implants made from Ti-6Al-4V alloy were evaluated during simulated implantation trials on animal bones. Three types of chitosan-based coatings were prepared using EPD: titanium nitride microparticles (TiNPs), titanium nitride nanoparticles (TiNNPs), and boron nitride particles (BNPs). Each of these coatings was also modified by adding a polylactic acid (PLA) layer using a dip-coating technique to compare their properties with and without this additional layer. The coatings were analysed using optical microscopy, confocal microscopy, and scanning electron microscopy (SEM) with elemental analysis. Surface roughness measurements of the coated implants were also conducted to highlight differences that could significantly influence the type and strength of the bone-implant interface, directly affecting the stability of the implant as an anchorage unit. Eventually, to evaluate the antibacterial properties of the EPD coatings, their antibacterial activity against both Gram-positive and Gram-negative bacteria strains was tested. Scanning electron observations confirmed the homogenous distribution of micro- and nanoparticles in all coatings. The highest surface roughness values were observed in layers containing titanium nitride nanoparticles (TiNNPs) and chitosan. The presence of an additional dip-coating PLA layer improved the adhesion, and its effect on the surface roughness depended on the particle size. While the antibacterial properties of the coatings show promising results, achieving optimal adhesion of the coatings to implants remains a challenge that requires further development.
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