Low-Cost Maskless Photolithography Using an LCD-3D Printer for Microelectronic Devices

Area of Science:

• Materials Science
• Microfabrication
• Nanotechnology

Background:

• Traditional photolithography relies on costly photomasks, limiting accessibility for microdevice fabrication.
• Masked Stereolithography Apparatus (MSLA) 3D printers offer potential for cost-effective patterning but require adaptation for microfabrication.

Purpose of the Study:

• To present a maskless photolithography method using a commercial LCD-based MSLA 3D printer.
• To demonstrate rapid and flexible patterning of silicon wafers for microdevice fabrication.
• To fabricate large-area wafer-scale electrode arrays and integrate two-dimensional (2D) materials.

Main Methods:

• Utilized a commercial LCD-based MSLA 3D printer for maskless photolithography.
• Patterned photoresist-coated silicon wafers without traditional photomasks.
• Fabricated gold electrodes for 2D material-based transistors and integrated MoS₂ flakes using an all-dry deterministic transfer method.

Main Results:

• Achieved spatial resolution approaching 20 µm.
• Successfully fabricated field-effect transistors and photodetectors using MoS₂.
• Demonstrated comparable device quality to conventional photolithography.

Conclusions:

• LCD-based MSLA 3D printing provides a cost-effective and flexible alternative for maskless photolithography.
• This approach enables high-precision microfabrication and the creation of advanced electronic devices.
• The method is highly accessible for researchers and industries requiring low-cost microdevice fabrication solutions.