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Updated: Jan 15, 2026
Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
Published on: May 23, 2018
High-quality polycrystalline vanadium dioxide thin films deposited via pulsed laser deposition with high uniformity
Zhixiang Huang1, Kyle Laskowski1, Sai Rahul Sitaram1
1Department of Materials Science and Engineering, College of Engineering, University of Delaware, Newark, DE 19716 USA.
Abstract:
Vanadium dioxide (VO2) is a phase transition material that experiences significant shifts in electrical, optical, and mechanical properties near its transition temperature. Among various methods for depositing VO2 thin films, pulsed laser deposition (PLD) provides precise stoichiometric control, good versatility, and high consistency. In this work, we introduce an optimized PLD-based method for depositing high-quality polycrystalline VO2 thin films. Experimental results demonstrate a resistance change of over four orders of magnitude during the phase transition, accompanied by high uniformity, with a thickness variation of less than 2% across a 100 mm wafer, and reliable reproducibility over time.
Supplementary Information:
The online version contains supplementary material available at 10.1007/s10854-025-15921-6.
