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Far-UVC (222 nm) Enhances the Advanced Reduction Process for Per- and Polyfluoroalkyl Substance (PFAS) Destruction

Xiaoyue Xin1, Jiaqi Li1, Ching-Hua Huang1

  • 1School of Civil and Environmental Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States.

ACS ES&T Water
|October 16, 2025
PubMed
Summary

Far-UVC (222 nm) light combined with sulfite advanced reduction processes (ARPs) significantly enhances per- and polyfluoroalkyl substances (PFAS) degradation in water. This UV222/sulfite method is more energy-efficient and effective than traditional UV254/sulfite systems.

Keywords:
Far-UVCKrCl* excimer lampPFASPFOSadvanced reduction processdefluorinationhydrated electronwater treatment

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