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Updated: Jan 14, 2026

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Superintegrated conformable organic transistors based on a universal microlithographic strategy
Yanping Ni1, Xiaoli Zhao2, Chuang Xue1
1State Key Laboratory of Integrated Optoelectronics, Key Laboratory for UV Light-Emitting Materials and Technology of Ministry of Education, School of Physics, Northeast Normal University, Changchun, China.
Abstract:
Conformable organic thin-film transistors (OTFTs) are identified as a core electronic component for next-generation wearable and implantable electronics. However, the lack of high-level integration of high-performance conformable devices remains a major obstacle to the commercialization of organic transistors. Here, a universal and non-destructive dual protective layer photolithography strategy is proposed, which is compatible with all organic materials, including conductors, semiconductors and insulators, with pattern precision of 0.5 µm. This approach enables the fabrication of ultrahigh-density OTFTs that demonstrate a mobility of 2.21 cm2V-1s-1 at a density of 64,288 transistors/cm2, scalable to scaled up to 5,120,000 transistors/cm2 while maintaining a mobility of ~1 cm2V-1s-1. Moreover, the devices show remarkable stability (10,000 switching cycles/100,000 folding cycles) and have been successfully integrated into sub-micron circuits and flexible displays, demonstrating strong application potential. This work offers a universal wafer-level manufacturing and integration pathway for ultrahigh-density, high-performance conformable devices, advancing the industrialization of conformable electronics.

