Weak temperature dependence of orbital Hall angle in Ta/Ni bilayers

Tianren Luo1,2,3, Qingtao Xia1,2, Junda Qu1,2

  • 1Fert Beijing Institute, MIIT Key Laboratory of Spintronics, School of Integrated Circuit Science and Engineering, Beihang University, Beijing 100191, People's Republic of China.

Nanotechnology
|October 21, 2025
PubMed
Summary

Orbital Hall effect (OHE) in Ta/Ni bilayers was investigated across temperatures. OHE dominates over spin Hall effect (SHE), showing weak temperature dependence, advancing orbitronics applications.

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