You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Updated: Jan 14, 2026

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis
Published on: May 10, 2021
Yuta Shuseki1,2, Akihiko Fujiwara3, Nobuhiko Mitoma4
1Graduate School of Engineering, Kyoto University, Kyoto, 615-8520, Japan.
Silicon doping enhances the thermal stability of amorphous indium oxide (ISO), preventing crystallization even at high temperatures. This structural modification is crucial for maintaining the amorphous state in advanced material applications.
11:33All-electronic Nanosecond-resolved Scanning Tunneling Microscopy: Facilitating the Investigation of Single Dopant Charge Dynamics
Published on: January 19, 2018
08:55Methods of Ex Situ and In Situ Investigations of Structural Transformations: The Case of Crystallization of Metallic Glasses
Published on: June 7, 2018
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: