Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

Cationic Chain-Growth Polymerization: Mechanism00:57

Cationic Chain-Growth Polymerization: Mechanism

The cationic polymerization mechanism consists of three steps: initiation, propagation, and termination. In the initiation step of the polymerization process, the π bond of a monomer gets protonated by the Lewis acid catalyst, which is formed from boron trifluoride and water. The protonation of the π bond generates a carbocation stabilized by the electron‐donating group. In the propagation step, the π bond of the second monomer acts as a nucleophile and attacks the generated carbocation,...

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Homocysteine and bone metabolism markers in osteoporotic patients: A secondary analysis.

Medicine·2026
Same author

Templated Oxide Synthesis on Self-Assembled PS<i>-b-</i>PMMA via Atomic Layer Deposition.

ACS applied materials & interfaces·2026
Same author

Rapid and noninvasive artificial intelligence-assisted diagnostic method for oral squamous cell carcinoma.

NPJ digital medicine·2026
Same author

Simultaneous removal of fluoride and disinfection by-product precursors through Zr salt enhanced coagulation.

Journal of environmental sciences (China)·2026
Same author

Cas12a Trans-Cleavage of Hairpins Triggers a CHA Cascade for an Ultrasensitive SERS Aptasensor.

ACS sensors·2026
Same author

High-Density Sub-10 nm Silicon Nanowires Fabricated via Directed Self-Assembly and Sequential Infiltration Synthesis Synergistic Patterning for Multiple Applications.

ACS nano·2026

Related Experiment Video

Updated: Jun 26, 2026

Using Polystyrene-block-polyacrylic acid-coated Metal Nanoparticles as Monomers for Their Homo- and Co-polymerization
09:02

Using Polystyrene-block-polyacrylic acid-coated Metal Nanoparticles as Monomers for Their Homo- and Co-polymerization

Published on: July 9, 2015

12.8K

Directed Self-Assembly of an Acid-Responsive Block Copolymer for Hole-Shrink Process and Pattern Transfer.

Jianghao Zhan1, Jiacheng Luo1, Zixin Zhuo1

  • 1Center of Micro-Nano System, School of Information Science and Technology, Fudan University, Shanghai 200438, China.

Nanomaterials (Basel, Switzerland)
|October 28, 2025
PubMed
Summary

We developed an acid-cleavable block copolymer for semiconductor manufacturing. This innovation enhances directed self-assembly (DSA) etch selectivity, enabling high-fidelity nanopatterning for advanced electronic devices.

Keywords:
Schiff base bondacid-responsiveblock copolymers (BCPs)directed self-assembly (DSA)pattern transferpolystyrene-block-poly (methyl methacrylate) (PS-b-PMMA)thin film self-assemblywet etching

More Related Videos

Fabricating Degradable Thermoresponsive Hydrogels on Multiple Length Scales via Reactive Extrusion, Microfluidics, Self-assembly, and Electrospinning
12:07

Fabricating Degradable Thermoresponsive Hydrogels on Multiple Length Scales via Reactive Extrusion, Microfluidics, Self-assembly, and Electrospinning

Published on: April 16, 2018

14.0K
Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers
10:09

Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

Published on: June 30, 2018

8.6K

Related Experiment Videos

Last Updated: Jun 26, 2026

Using Polystyrene-block-polyacrylic acid-coated Metal Nanoparticles as Monomers for Their Homo- and Co-polymerization
09:02

Using Polystyrene-block-polyacrylic acid-coated Metal Nanoparticles as Monomers for Their Homo- and Co-polymerization

Published on: July 9, 2015

12.8K
Fabricating Degradable Thermoresponsive Hydrogels on Multiple Length Scales via Reactive Extrusion, Microfluidics, Self-assembly, and Electrospinning
12:07

Fabricating Degradable Thermoresponsive Hydrogels on Multiple Length Scales via Reactive Extrusion, Microfluidics, Self-assembly, and Electrospinning

Published on: April 16, 2018

14.0K
Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers
10:09

Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

Published on: June 30, 2018

8.6K

Area of Science:

  • Materials Science
  • Nanotechnology
  • Polymer Chemistry

Background:

  • Directed self-assembly (DSA) using polystyrene-block-poly (methyl methacrylate) (PS-b-PMMA) is crucial for semiconductor manufacturing, particularly for contact holes and vias.
  • A key limitation of current PS-b-PMMA DSA is the poor etch selectivity between PS and PMMA domains, hindering pattern fidelity.

Purpose of the Study:

  • To develop an acid-responsive block copolymer for improved DSA etch selectivity and high-fidelity nanopatterning.
  • To integrate an acid-cleavable linkage into the PS-b-PMMA system compatible with existing semiconductor manufacturing processes.

Main Methods:

  • Synthesis of an acid-responsive block copolymer, PS-N=CH-PMMA, via Schiff base linkage formation between PMMA-CHO and PS.
  • Characterization of thin films using X-ray photoelectron spectroscopy (XPS) and Ohta-Kawasaki simulations.
  • Application in graphoepitaxial DSA on 193i pre-patterned templates followed by acetic acid treatment and pattern transfer into TEOS layers.

Main Results:

  • Uniform thin films with vertically oriented cylindrical domains were achieved.
  • Selective cleavage of Schiff base linkages under acidic conditions enabled direct conversion to high-fidelity PS masks without UV exposure.
  • Shrink-hole patterns with reduced critical dimension (CD) and improved local CD uniformity (LCDU) were fabricated, with tunable CD via PMMA-CHO molecular weight.
  • Successful pattern transfer into TEOS layers with minimal CD loss was demonstrated.

Conclusions:

  • The acid-cleavable block copolymer offers a scalable solution for high-fidelity nanopatterning in semiconductor manufacturing.
  • This approach enhances etch contrast and provides tunable process windows, integrating seamlessly with existing PS-b-PMMA lithography platforms.
  • The developed material overcomes limitations of conventional DSA, paving the way for advanced microelectronic fabrication.