Unified modeling of Hartmann and Talbot wavefront sensors for EUV to soft X-ray applications

Wavefront sensing in the EUV to soft X-ray regime is critical for high-resolution imaging, precision metrology, and beam diagnostics in advanced light sources, including HHG sources, SR, and XFEL facilities. Hartmann and Talbot wavefront sensors, while similar in structural configuration, operate based on distinct physical principles-geometric optics and near-field diffraction, respectively. In this study, we present a unified theoretical framework based on Fresnel diffraction to model and compare the performance of both sensing approaches. Numerical simulations, supported by visible-light experiments with a He-Ne laser, demonstrate the validity of the model under realistic conditions. The proposed framework facilitates the design and optimization of X-ray wavefront sensors, enabling improved beam quality characterization and more efficient beamline alignment. This work provides a practical methodology for wavefront-based diagnostics in advanced photon science facilities, contributing to enhanced experimental precision and operational efficiency.