Atomic Layer Deposition for Perovskite Solar Cells: Interface Engineering, Stability Enhancement, and Future...

Area of Science:

• Materials Science
• Renewable Energy
• Nanotechnology

Background:

• Perovskite solar cells (PSCs) show high power conversion efficiency (PCE) but suffer from poor stability and carrier recombination.
• Atomic layer deposition (ALD) offers atomic-level control, uniformity, and interfacial engineering crucial for overcoming PSC limitations.

Purpose of the Study:

• To review the diverse applications of ALD in PSCs.
• To analyze the mechanisms by which ALD improves PSC efficiency and stability.
• To discuss the challenges and future outlook of ALD in PSC technology.

Main Methods:

• Summarizing ALD applications in PSCs, including low-temperature synthesis.
• Detailing ALD's role in thickness and composition control, defect passivation, and encapsulation.
• Reviewing ALD's use in tandem PSC architectures.

Main Results:

• ALD enables precise film deposition (approx. 1 nm/10 cycles) and effective defect passivation.
• ALD-based encapsulation achieves low water vapor transmission rates (WVTR) as low as 10^-6 g·m^-2·day^-1.
• ALD contributes to enhanced PCE and operational stability in various PSC configurations.

Conclusions:

• ALD is a versatile technique for advancing PSC performance and durability.
• Further research into ALD processes can unlock the full potential of perovskite photovoltaics.
• ALD presents a promising pathway for the commercialization of stable and efficient PSCs.