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Carbon Impurity Entrapping and Charge Localization within TiO2 Nanoparticle Films
Guillem Vives Ollé1, Gilles R Bourret1, Thomas Berger1
1Department of Chemistry and Physics of Materials, Paris-Lodron University Salzburg, Jakob-Haringer-Straße 2a, A-5020 Salzburg, Austria.
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Titanium dioxide (TiO2) particle systems are well-established photocatalysts with high performance under UV irradiation. They are often used as supported nanostructured thin films composed of interconnected TiO2 nanoparticles. During the film preparation, a variety of defects can be introduced, which can have a significant influence on the material performance. This can be used for defect engineering to enhance charge generation and separation within photocatalysts. We report here a study of the paramagnetic properties of four different TiO2 nanoparticle architectures. The spin concentrations measured on supported films and free-standing nanoparticles, in the presence or absence of dense TiO2 thin films prepared via sputtering, are compared. Organic additives are typically used for the immobilization of powdered photocatalyst materials or the production of photoelectrodes. Despite extensive cleaning and oxidative treatment for all cases where nanoparticle aggregation can occur or interfaces can form between the particles and the silicon substrate, paramagnetic carbon-related defects appear and become part of the lattice. In the concentration range of a few parts per million, underlying carbonecks act as electron traps and represent a previously overlooked defect type that may determine the photoelectronic properties of TiO2-based nanostructures.
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