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Hydrazine Intercalation into 2D MoTe2 Field Effect Transistor as Charge Trapping Sites for Nonvolatile Memory
Li Yuan1,2,3, Yongyu Wu1,4, Haohui Ou2
1ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou 311200, China.
None:
Driven by the demands of artificial intelligence, big data and the Internet of Things, non-volatile memory has become the cornerstone of modern computing. However, at present, most of the preparation processes are quite complex and have high requirements for the materials. Here, we discovered that hydrazine (N2H4) molecules can be efficiently intercalated into the MoTe2, acting as stable charge-trapping centers. This intercalation not only induces a controllable reversible polar conversion but also causes a huge hysteretic window (>60 V) lasting over one hour in air. Leveraging this giant hysteresis, we fabricated a simplified memory device. The device demonstrates a large erase/program current ratio of ~104 and excellent retention characteristics. Our work pioneers the use of interlayer molecular intercalation for electronic modulation in 2D semiconductors, offering a new paradigm for developing memory devices with fabrication processes.
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