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Neutral Octa-Adamantane Chalcogenidometalate Clusters via Amine Complexation and Organotin Termination for
Ming-Bu Luo1, Er-Xia Chen1, Juan Wang1
1State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian, 350002, China.
Abstract:
Supertetrahedral chalcogenidometalate clusters, inspired by zinc-blende-type quantum dots, integrate both chemical and geometrical uniqueness. However, their inherent negative charge and rigid Td symmetry restrict configurational diversity and functional utility. Herein, a synergistic strategy combining polyamine coordination and butyltin termination is employed to synthesize neutral chalcogenidometalate supertetrahedral clusters. Two distinct classes are presented: (1) tetra-adamantane clusters (TA-amine; amine = tris(2-aminoethyl)amine (TAEA), triethylenetetramine (TETA), tetraethylenepentamine (TEPA)) with 14 metal sites and (2) octa-adamantane clusters (OA-X; X═S/Se) with 20 metal sites-the largest neutral supertetrahedral clusters known to date. The OA-X clusters exhibit unprecedented C2v geometry, deviating from conventional Td, thereby validating the efficacy of polyamine-arylstannane synergy in advancing cluster chemistry. Charge neutrality and peripheral organic shells confer exceptional solubility and stability in some common solvents, enabling the fabrication of high-quality films for nanopatterning. Electron beam lithography (EBL) reveals that OA-X-based films enable 50 nm line patterning, with the OA-Se version demonstrating the higher sensitivity-a result attributable to the large photoabsorption cross-section of selenium. Solubility-switching behavior is attributed to radiation-induced phase transitions from discrete clusters to chalcogenidometalate nanoparticles. This work bridges molecular precision with functional material design, offering insights into charge-neutral cluster engineering for extreme ultraviolet (EUV) nanolithography.
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