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Updated: Jun 9, 2026

Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds
Published on: December 2, 2013
Sequential Phosphorus Doping and Selective Etching: A Dual-Step Approach for CO2 Reduction Pathway Regulation in
Xiaoxu Wei1,2,3, Zijian Wang1,2,3, Qing Xie1,2,3
1State Key Laboratory of Rare Earth Resource Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun, 130022, China.
None:
CO2 hydrogenation is a significant way to reduce carbon emissions, but it is facing serious challenges in selectivity control. Herein, we report a sequential dual-step surface modulation strategy comprising phosphorus (P) incorporation into CeO2 supports followed by selective ascorbic acid (AA)-mediated etching. This approach enables precise tuning of product selectivity while maintaining exceptional catalytic activity. The final Rh/CeO2-P-AA catalyst exhibits a significant enhancement in the CO generation rate, reaching 1336.3 molCO molRh -1 h-1 with nearly 100% CO selectivity, almost 1.9 times higher than that of Rh/CeO2-P (691.8 molCO molRh -1 h-1) and 6.7 times higher than that of Rh/CeO2 (199.9 molCO molRh -1 h-1). The incorporation of P induces an elevation of the surface states of Rh species, contributing to lower adsorption capacity for CO, thus leading to the selectivity changes. More importantly, benefiting from the weak acidity and reducibility, AA can assist in the re-movement of some of the phosphate radicals and the partial reduction of Ce4+, thereby providing more oxygen defects for activating CO2.
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