Related Experiment Video
Updated: Jan 6, 2026

Harvesting Solar Energy by Means of Charge-Separating Nanocrystals and Their Solids
Published on: August 23, 2012
Regulating the Microstructure of Sb2Se3 Films via a MoOx Nanocrystal Interfacial Layer for Efficient
Lu Lu1, Jianjun Jiang1, Hao Wang1
1School of Materials, Shenzhen Campus of Sun Yat-sen University, No. 66, Gongchang Road, Guangming District, Shenzhen, Guangdong 518107, P. R. China.
Abstract:
Sb2Se3 photocathodes are promising candidates for photoelectrochemical hydrogen production, but their performance is often limited by insufficient light harvesting and severe charge recombination. Here, we introduce a MoOx nanocrystal interfacial layer to regulate the microstructure and interfacial properties of Sb2Se3 films. When grown on Mo/MoOx substrates, Sb2Se3 develops a nanocolumnar crystal structure with improved crystallographic orientation compared to films deposited directly on Mo, forming a light-trapping morphology that reduces reflectance and enhances absorption. In addition, MoOx functions as a hole transport layer, creating proper band alignment with Sb2Se3 to facilitate interfacial carrier transfer and mitigate charge accumulation and recombination losses. Transient absorption spectroscopy confirms that the presence of MoOx accelerates photogenerated carrier separation and prolongs carrier lifetime. Benefiting from these synergistic effects, the optimized Mo/MoOx/Sb2Se3/Pt photocathode achieves an approximately 40% enhancement in maximum photocurrent and a positive shift in onset potential relative to Mo/Sb2Se3/Pt. This work demonstrates an effective strategy to boost the performance of Sb2Se3-based photoelectrodes and provides valuable insights for interface and structural engineering in semiconductor devices.
More Related Videos
08:50Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
08:12Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015