Semiconductors
Non-ohmic Devices
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Updated: Jan 9, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Lomash Chandra Acharya1, Khoirom Johnson Singh2, Neha Gupta1
1Microelectronics and VLSI Group, Department of Electronics and Communication Engineering, Indian Institute of Technology Roorkee, Roorkee, Uttarakhand 247667, India.
This study introduces a novel method for characterizing standard cells in nanoscale CMOS circuits, accounting for Total Ionizing Dose (TID) effects. The approach ensures accurate timing predictions in radiation environments, enhancing digital circuit reliability.
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