Copper Selenide Nanosheet with Adjustable Cation Vacancy for Boosting Nitrogen Electroreduction
Xiaohan Li1, Shuo Chen2, Yuao Wei2
1Department of Chemistry, College of Sciences, Northeastern University, Shenyang 110819, P. R. China.
ACS Applied Materials & Interfaces
|December 10, 2025
Summary
Researchers engineered copper selenide nanosheets with specific copper vacancies (VCu) to boost the electrochemical nitrogen reduction reaction (NRR) for sustainable ammonia synthesis. The optimized catalyst significantly enhanced ammonia production rates, offering a new path for high-performance electrocatalysts.
Area of Science:
- Materials Science
- Electrochemistry
- Catalysis
Background:
- Electrochemical nitrogen reduction reaction (NRR) is a sustainable method for ammonia synthesis.
- Vacancy engineering in catalysts enhances nitrogen-to-ammonia conversion.
- Controlling cation vacancy concentration in catalysts is challenging.
Purpose of the Study:
- To develop a method for fabricating copper selenide nanosheets with precisely tuned copper vacancy (VCu) concentrations.
- To investigate the effect of VCu concentration on NRR performance.
- To provide insights into the role of VCu sites in ammonia synthesis.
Main Methods:
- Combined thermal treatment and plasma approach for catalyst synthesis.
- Fabrication of copper selenide nanosheets with varying VCu concentrations.
- Electrochemical characterization of catalysts for NRR activity.
Main Results:
- A catalyst (p-Cu1.8Se/Cu2Se/C-5) with the highest VCu concentration showed superior NRR activity.
- Achieved an NH3 production rate of 21.81 μg h-1 mgcat.-1 at -0.7 V vs RHE, over 3-fold higher than vacancy-free.
- Identified VCu sites as active centers optimizing nitrogen adsorption and activation.
Conclusions:
- Precisely engineered copper vacancies significantly enhance NRR performance.
- VCu sites lower the energy barrier for ammonia synthesis.
- This defect engineering approach offers a new strategy for designing advanced NRR electrocatalysts.
Keywords:
cation vacancydefect engineeringmetal−organic framework derivativenitrogen reduction reactionplasma etching

