Versatile Reactive Gradient Block Copolymer System for Highly Robust Nanopatterns With Spontaneous Vertical...

Area of Science:

• Materials Science
• Polymer Chemistry
• Nanotechnology

Background:

• Directed self-assembly of high-χ block copolymers (BCPs) is crucial for semiconductor device performance.
• Conventional BCPs face limitations in chemical tunability and vertical orientation, hindering practical applications.

Purpose of the Study:

• To develop a novel reactive polymer gradient-random block copolymer (GRC-BCP) system.
• To enable the fabrication of vertically oriented nanostructures with tunable properties on diverse substrates.

Main Methods:

• Synthesis of poly(methyl methacrylate-block-(pentafluorophenyl acrylate-gradient-styrene)) GRC-BCP.
• Utilizing the tailored gradient block structure for vertical pattern formation without surface neutralization.
• Application as a photoresist height enhancer in extreme ultraviolet lithography.

Main Results:

• Achieved vertically oriented patterns with controlled linewidths from 7 to 13 nm in organosilicon and organotin GRC-BCPs.
• Demonstrated the GRC-BCP's utility as a robust photoresist height enhancer.
• Fabricated Si patterns with high aspect ratio (5.78) at 13 nm half-pitch, exhibiting low line edge and width roughness.

Conclusions:

• The developed reactive polymer GRC-BCP system offers efficient synthesis and broad utility.
• This platform material is suitable for applications requiring vertically oriented patterns with specific functionalities.
• The GRC-BCP system is expected to advance semiconductor fabrication and other nanotechnology fields.