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Updated: Jan 8, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Two-Dimensional/Three-Dimensional Interface-Driven Photocarrier Dynamics in MoSe2/GaTe/ZnGa2O4 Heterostructures for
Santanu Kandar1, Taslim Khan1, Kamlesh Bhatt1
1Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016, India.
None:
Deep ultraviolet (DUV) photodetectors are vital for a wide range of advanced applications, including space exploration, environmental monitoring, and secure optical communication. However, although conventional oxide-based photodetectors exhibit high responsivity, they often suffer from limited response speed. To address these challenges, we demonstrate a high-performance DUV photodetector based on a 2D/3D heterostructure comprising few-layer MoSe2 and GaTe, grown via molecular beam epitaxy on a metal-organic chemical vapor deposition-grown zinc gallium oxide (ZnGa2O4) layer on a c-plane sapphire template. The crystallinity and structural quality of the as-grown 2D/3D heterostructure were confirmed through in situ RHEED, TEM, XPS, and XRD analyses. The resulting photodetector exhibits a peak responsivity of 216.6 A/W, with a rise time of 2 ms and a decay time of 3 ms under DUV illumination. Both the response speed and responsivity are significantly enhanced compared to devices fabricated solely on ZnGa2O4. This improved performance is attributed to efficient interfacial charge transfer and favorable carrier dynamics enabled by the band alignment at the 2D/3D interface. These findings highlight the advantages of integrating 2D-layered materials with wide-band gap oxides, offering a promising pathway toward next-generation, high-speed DUV optoelectronic devices.
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