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Related Concept Videos

MOS Capacitor01:25

MOS Capacitor

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A Metal-Oxide-Semiconductor (MOS) capacitor is a fundamental structure used extensively in semiconductor device technology, particularly in the fabrication of integrated circuits and MOSFETs (metal-oxide-semiconductor field-effect transistors). The MOS capacitor consists of three layers: a metal gate, a dielectric oxide, and a semiconductor substrate.
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In most substances, the current flow is proportional to the voltage applied to it. A simple relationship between the values of current, voltage, and resistance is known as Ohm's law. Nonohmic devices do not exhibit a linear relationship between voltage and current. One such device is the semiconducting circuit element known as a diode. A diode is a circuit device that allows current flow in only one direction.
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Updated: Jan 8, 2026

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
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Recent Advances in Inorganic Oxide-Based Resistive Random Access Memory: Challenges and Strategies for Practical

Anurag Pritam1,2, Anwesha Mahapatra1, Ritu Gupta1

  • 1Department of Chemistry, Indian Institute of Technology Kanpur, Kanpur, India.

Chempluschem
|December 13, 2025
PubMed
Summary
This summary is machine-generated.

Resistive random-access memory (RRAM) offers fast, scalable, low-power nonvolatile memory solutions. This review highlights advances in oxide-based RRAM, crucial for next-generation neuromorphic computing and brain-inspired hardware.

Keywords:
RRAMarray level integrationmemristorsneuromorphic computingoxide materialtwo‐terminal devices

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Area of Science:

  • Materials Science
  • Electrical Engineering
  • Computer Science

Background:

  • Resistive random-access memory (RRAM) is a key emerging nonvolatile memory technology.
  • RRAM offers advantages like high speed, scalability, low power, and CMOS compatibility.
  • Its operation involves resistance modulation in dielectric materials, suitable for neuromorphic applications.

Purpose of the Study:

  • To review recent advancements in oxide-based RRAM devices.
  • To compare RRAM developments with conventional memory technologies.
  • To discuss the role of RRAM in neuromorphic computing.

Main Methods:

  • Literature review of oxide-based RRAM.
  • Analysis of switching mechanisms (e.g., filamentary).
  • Comparison with existing memory technologies.

Main Results:

  • Oxide-based RRAM has evolved significantly from early memristor concepts.
  • Various inorganic and organic materials enable tunable switching and multilevel storage.
  • RRAM shows promise for low-power, high-density, and brain-inspired computing.

Conclusions:

  • Oxide-based RRAM represents a foundational platform for advanced memory solutions.
  • RRAM technology is critical for the future of neuromorphic computing.
  • Further research is needed to address current challenges and unlock full potential.