Bis(2-amino-5-thienyl)Ketone as Oxygen Tolerant Sensitizer for Conventional Radical Photopolymerization

Taner Poplata1, Qunying Wang1, Xavier Allonas2

  • 1Institute for Coatings and Surface Chemistry, Department of Chemistry, Niederrhein University of Applied Sciences, Adlerstr. 1, 47798, Krefeld, Germany.

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